Zaheer Ahamed, Ravishankar K.M , A.R.Anwar Khan
The combination of two ceramic materials gives very good results. The same two ceramic materials when synthesized at nano level give extra-ordinary results. In this context, this research project uses alumina and silica as two ceramic materials. They are synthesized with the aid of electron beam lithography. PMMA is used as resist material instead of negative resists. This is because of the PMMA resist will give the desired results. It is spin coated with 6000 rpm in order to get the desired results. Then this is used in electron beam lithography which is a maskless lithography and which overcomes the limitations in mask lithography. After co-deposition of Al2O3 and SiO2 with the help of sputtering then finally characterization has taken place. In this characterization, Scanning electron microscope (SEM) images are taken and then finally atomic force microscope (AFM) images are taken in order to know the 3D images, adhesiveness, and surface roughness.